Integrated circuit - Wikipedia, the free encyclopedia
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In electronics, an integrated circuit (also known as IC , microcircuit , microchip , silicon chip , or chip ) is a miniaturized electronic circuit (consisting mainly of semiconductor devic...
en.wikipedia.org/wiki/Integrated_circuit
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The fabrication of integrated circuits consists basically of the following process steps: ... Lithography: The process for pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface. The photo-resist is hardened by baking and than selectively removed by projection of light...
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www.iue.tuwien.ac.at/phd/ceric/node8.html
www.iue.tuwien.ac.at/phd/ceric/node8.html
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Back in 1996, there were not that many institutions that provided a fabrication facility to an undergrad. This lab was on the physical theory, design and fabrication of devices suitable for integrated circuitry;
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www.estss.com/NCS/PROJECTS/344_ICfab/
www.estss.com/NCS/PROJECTS/344_ICfab/
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IC Fabrication Processes; n; Ion Implantation ions are accelerated to energies of 20 keV - 3 MeV and bombard the silicon wafer in a collimated beam ion tracks in the ... In order to make an IC, we need; 1. the mask patterns (the; layout; ); 2. the sequence of fabrication steps (the; process; ... or; recipe; );
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www.prenhall.com/howe3/microelectronics/pdf_folder/lect...
www.prenhall.com/howe3/microelectronics/pdf_folder/lectures/mwf/lecture4.fm5.pdf
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There are many inventions described and illustrated herein. ... In response thereto, one or more process parameter sensors sample, sense, detect, characterize, analyze and/or inspect one or more parameters of the process in real time (i.e., during the fabrication process).
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www.patentgenius.com/patent/7171334.html
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The present invention relates to semiconductor devices and, more particularly, to a novel method for forming conducting pillars which are defined by insulating spacers of a previous conducting layer in an (IC) fabrication process.
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www.patentgenius.com/patent/5100838.html
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D. A. Antoniadis and R. W. Dutton. Models for computer simulation of complete IC fabrication process. IEEE J. Solid-State Circuits, SC-14(2):412--430, 1979. ... D. A. Antoniadis and R. W. Dutton. Models for computer simulation of complete IC fabrication process. IEEE J. Solid-State Circuits, SC-14(2):412-430,;
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citeseer.ist.psu.edu/context/236432/0
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Title : Computer Modeling of the Complete IC Fabrication Process. ... The overall features of SUPREM allow for process design, fundamental kinetic studies and process control applications. Understanding and quantitative modeling of moving boundary oxidation and epitaxial growth conditions has been achieved.
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stinet.dtic.mil/oai/oai?verb=getRecord&metadataPrefix=h...
stinet.dtic.mil/oai/oai?verb=getRecord&metadataPrefix=html&identifier=ADA089241
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Process and device modeling, especially in two-dimensions, for the complete integrated circuit fabrication process is reported. New understanding of oxidation and diffusion effects in silicon are reported and new computer tools and techniques are discussed. ... Title : Computer Modeling of Complete IC Fabrication Process.
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stinet.dtic.mil/oai/oai?verb=getRecord&metadataPrefix=h...
stinet.dtic.mil/oai/oai?verb=getRecord&metadataPrefix=html&identifier=ADA138006
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