to assure that all electrodes make satisfactory contact with the body. .... to simulate the poor electrode contact which we have often ...
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ieeexplore.ieee.org/iel5/4352184/4352185/04353076.pdf
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The first problem is to reduce the effective electrode contact resistance seen by the measuring system. The second problem is to reduce as much as possible the wire-to-ground capacitance in the system. Both problems must be solved by changes in the survey design, since they are essentially site-dependent.
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www.zonge.com/PDF_Papers/Electrode%20Contact%20Resistan...
www.zonge.com/PDF_Papers/Electrode%20Contact%20Resistance.pdf
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Journals which have transferred from Oxford Journals to another publisher in previous years ... BWP Update - for further information contact BirdGuides ... Contact Us...
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ietele.oxfordjournals.org/cgi/reprint/E91-C/12/1856.pdf
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An electrode contact device for use with metallurgical electric furnaces which comprises a copper body member and a contact member in the form of a powder ...
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www.freepatentsonline.com/3671656.html
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5. A return electrode contact monitor as set forth in claim 1 wherein said first means includes a DC to AC converter having an AC output and a DC input, said resistance of a return part of the patient circuit being applied to said AC output, said converter providing a DC resistance at said DC input that varies...
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www.freepatentsonline.com/4848335.html
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With respect to the operation of a Phase-change Random Access Memory (PRAM or PcRAM), we studied the effect of the contact between the electrode metal and the chalcogenide glass, N2 doped Ge2Sb2Te5 in this report.
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www.mrs.org/s_mrs/sec_subscribe.asp?CID=2687&DID=114556...
www.mrs.org/s_mrs/sec_subscribe.asp?CID=2687&DID=114556&action=detail
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A method for forming a grown bipolar transistor electrode contact wherein a substrate (12) is provided. ... The conductive region (34) forms the grown bipolar electrode contact by electrically contacting the doped region (31). The conductive region (34) is optionally overgrown in a lateral direction over a top surface...
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www.patentgenius.com/patent/5213989.html
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A contact hole in a diffusion region is narrowed by a buffer layer formed at about the middle of an interlayer insulating film in its thickness direction. This buffer layer serves as effective alignment tolerances to the diffusion region and a contact electrode at the time of forming the contact hole.
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www.patentgenius.com/patent/5330934.html
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The support pedestal may form an electrode as well as a heat sink or source. Such support pedestals are used in etching processes as well as chemical vapor deposition (CVD) or physical vapor deposition (PVD) applications.
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www.patentstorm.us/patents/5745332-description.html
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